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Patent Searching and Data


Title:
METHOD OF FORMING FINE PATTERN
Document Type and Number:
Japanese Patent JP2002344117
Kind Code:
A
Abstract:

To easily form a copper wiring pattern having the designed width and thickness.

After copper foil having a thickness of ≤12 μm is patterned by a subtractive method, the pattern is plated with copper by the copper electroplating method.


Inventors:
IIDA MASAFUMI
Application Number:
JP2001142562A
Publication Date:
November 29, 2002
Filing Date:
May 14, 2001
Export Citation:
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Assignee:
NIPPON CMK KK
International Classes:
C25D5/18; C25D7/00; H05K3/18; (IPC1-7): H05K3/18; C25D5/18; C25D7/00
Domestic Patent References:
JP2000031612A2000-01-28
JPS644093A1989-01-09
JP2000294903A2000-10-20
JPH02114693A1990-04-26
JP2000087292A2000-03-28
Attorney, Agent or Firm:
Miyuki Ariga (6 people outside)