Title:
METHOD FOR FORMING FINE PATTERN
Document Type and Number:
Japanese Patent JP3689093
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for forming a fine pattern being regularly arrayed to a high degree and having a high aspect ratio on the surface of a workpiece.
SOLUTION: The method for forming the fine pattern has a process in which a multilayer particle film (12) is formed by coating the upper section of the workpiece (11) with core shell particles (13), in which shell layers (13b) are coated with core particles (13a), in two layers or more; a process in which an etching mask pattern (14) containing the core particles supported by a material for the shell layers is formed by a dry etching to the multilayer particle film; and a process in which the fine pattern (15) is formed to the workpiece by transferring the shape of the etching mask pattern on the workpiece.
Inventors:
Yasuyuki Hieda
Yoshiyuki Kamada
Satoshi Kitsuki
Yoshiyuki Kamada
Satoshi Kitsuki
Application Number:
JP2003093576A
Publication Date:
August 31, 2005
Filing Date:
March 31, 2003
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
B81C1/00; H01L21/027; H01L21/3065; (IPC1-7): H01L21/027; B81C1/00; H01L21/3065
Domestic Patent References:
| JP11045990A |
Foreign References:
| WO2001068513A1 |
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Sadao Muramatsu
Ryo Hashimoto
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