Title:
METHOD OF FORMING MICROPATTERN
Document Type and Number:
Japanese Patent JP2010012520
Kind Code:
A
Abstract:
To provide a method of forming a lattice-like pattern comprising minute thin groove patterns of a pitch of 1 nm to 1 mm or longer.
A processed section in which thin grooves are formed is pulse-driven, and the thin groove processing is controlled by controlling each drive energy. Since the lower limit of miniaturization of the processing is 1 nm, a higher order architecture is formed, and the processed section is easily prepared, and the processing linear velocity is high while the method has such a feature that can multi-process the portion to be processed, a wide or long workpiece machining is performed.
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Inventors:
ODA YOSHIHISA
Application Number:
JP2008168359A
Publication Date:
January 21, 2010
Filing Date:
June 27, 2008
Export Citation:
Assignee:
NIPPON CATALYTIC CHEM IND
International Classes:
B23D5/00; B23B1/00; G02B5/18