To provide a method for forming an organic conductive thin film capable of preventing formation of a step at the boundary of plural parts without causing deterioration in the organic conductive thin film, with a simple process.
A pentacen thin film 4 is formed on a silicon substrate 1 where electrodes 3A, 3B are formed, and a photomask 5 is placed on it. A width W of a chrome pattern 51 is the same as the clearance between the electrodes 3A, 3B. The chrome pattern 51 is arranged on a part 43 between the electrodes 3A, 3B of the thin film 4. An oxygen current is brought into contact with the thin film 4, and the thin film 4 is irradiated with ultraviolet rays 6 through the photomask 5. Thus, the part which is irradiated with ultraviolet rays becomes lower in the electric conductivity of the thin film 4 than that of the part 43 which is not irradiated with ultraviolet rays.
JP2003508797A | 2003-03-04 | |||
JP2003508924A | 2003-03-04 | |||
JPH05183050A | 1993-07-23 |
Yoshiaki Naito
Cui Shu Tetsu
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