METHOD OF FORMING ORGANIC MATERIAL PATTERN AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR

Title:

METHOD OF FORMING ORGANIC MATERIAL PATTERN AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR

Document Type and Number:

Japanese Patent JP2005079225

Kind Code:

A

Abstract:

To provide a method of easily forming an inorganic material pattern, especially, an organic channel in a thin film transistor.

By irradiating laser having an oscillation wavelength of 250-800 nm on part of an organic material layer formed on top of a substrate, that part of the organic material irradiated with the laser is sublimed to form a desired pattern.

Inventors:

TSUKAGOSHI KAZUHITO
YAGI IWAO
AOYANAGI KATSUNOBU

Application Number:

JP2003305844A

Publication Date:

March 24, 2005

Filing Date:

August 29, 2003

Export Citation:

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Assignee:

RIKAGAKU KENKYUSHO

International Classes:

B23K26/00; H01L21/027; H01L21/336; H01L29/786; H01L51/00; H01L51/05; H01L51/40; B23K101/40; (IPC1-7): H01L29/786; B23K26/00; H01L21/027; H01L21/336; H01L51/00

Domestic Patent References:

JP2003179360A	2003-06-27
JPH0818125A	1996-01-19
JPH06291312A	1994-10-18

Foreign References:

WO2003016599A1

2003-02-27

Attorney, Agent or Firm:

Patent Service Corporation Patent Office Sykes

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