To provide a method of forming an organic thin film which is easily adaptable to various kinds or sizes of substrates and can uniformly clean even the substrate, whose structure is complicated three-dimension, and by which a cleaning liquid can easily be obtained and preserved for a long period.
The method of forming the organic thin film on the surface of the substrate has a process (A) of cleaning the substrate with an alkaline aqueous solution, in which the concentration of an alkaline material is 1-20 mass%, for 1-60 min. The process (A) can be carried out before or after a process (B) of forming the organic thin film. As the alkaline aqueous solution, it is not especially limited as long as it is an aqueous solution exhibiting alkalinity. For example, an aqueous solution containing an inorganic salt such as an alkali metal as the alkaline material is included. Potassium hydroxide or the like is used as the inorganic salt; alkanol amines are used as amines; and an ammonia aqueous solution or the like is used as ammoniums; and these are used singly or in combination thereof.
HOSHI HIDEJI
Seiji Ozawa
Yusaku Tokai
Large High Toshiko
High Kazuya Tsu
Makoto Horiuchi
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