To suppress the infiltration of a developing liquid during processing and to form a more fine pattern in the development of a photosensitive photoresist and a photosensitive compound after exposing.

The infiltration of the developing liquid is suppressed and the unexposed photosensitive photoresist and photosensitive compound are removed even from the inner side of a fine pattern by the developing liquid by introducing a high pressure developing liquid and high pressure air into a nozzle and blowing a mixed fluid comprising the high pressure air and the developing liquid, wherein the developing liquid is made into fine particles by the high pressure air, from the nozzle. Thereby, it becomes possible to form a fine pattern.