Title:
METHOD FOR FORMING PATTERN, METHOD FOR FORMING WIRING PATTERN, ELECTRO-OPTIC APPARATUS AND ELECTRONIC APPLIANCE
Document Type and Number:
Japanese Patent JP2005062356
Kind Code:
A
Abstract:
To provide a method for forming a pattern for patterning a thin film by an easy low-cost apparatus configuration.
A thin film 2 is formed on a substrate 1 containing a photo-thermal converting material which converts light energy into heat energy, and the substrate 1 is irradiated with light to remove the thin film 2 corresponding to the irradiation region irradiated with the light so as to pattern the thin film 2.
Inventors:
TOYODA NAOYUKI
Application Number:
JP2003290657A
Publication Date:
March 10, 2005
Filing Date:
August 08, 2003
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
G03F7/004; B05D3/12; B05D7/00; B32B3/00; G02F1/1343; G03F7/11; G03F7/36; H01L21/027; H01L51/50; H05B33/10; H05B33/14; H05B33/26; H05K3/06; H05K3/10; H05K3/12; H05K3/14; (IPC1-7): G03F7/36; B05D3/12; B05D7/00; G02F1/1343; G03F7/004; G03F7/11; H01L21/027; H05B33/10; H05B33/14; H05K3/10
Attorney, Agent or Firm:
Masahiko Ueyanagi
Fujitsuna Hideyoshi
Osamu Suzawa
Fujitsuna Hideyoshi
Osamu Suzawa