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Title:
光触媒構造物の形成方法およびそれによって得られる光触媒構造物
Document Type and Number:
Japanese Patent JP4546637
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for forming a photocatalyst structure having a primer layer of good adhesion with respect to an organic base material and a photocatalyst layer and excellent in durability, and the photocatalyst structure obtained thereby. SOLUTION: The method for forming the photocatalyst structure includes a process (1) for forming the primer layer by applying a primer paint to the organic base material, and a process (2) for forming the photocatalyst layer by coating the primer layer obtained in the process (1) with a photocatalyst paint. The primer paint contains an acrylic resin having a hydroxyl group with a number average mol.wt. of 1,000-50,000 and a tetrafunctional silicon compound represented by general formula 1 (wherein, R is same or different and is a 1-10C alkyl group or alkoxyalkyl group and (n) is an integer of 1-20) and/or a condensate thereof in a solid weight ratio of 1,000/1-1/3.

Inventors:
Nakamura Akinori
Makimura Satoshi
Ryozo Takakawa
Hiroyuki Izutsu
Kyoko Kawabata
Application Number:
JP2000336537A
Publication Date:
September 15, 2010
Filing Date:
November 02, 2000
Export Citation:
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Assignee:
NIPPON PAINT CO.,LTD.
Taki Chemical Co., Ltd.
International Classes:
B05D1/36; B01J21/06; B32B9/00; B01J35/02; B01J37/02; B05D7/24; C09D1/00; C09D133/00; C09D183/00
Domestic Patent References:
JP2000212509A
JP2000239563A
JP9249732A
JP1141952A
JP2000190415A
JP2000071377A
Attorney, Agent or Firm:
Katsuto Momii