高分子材料被膜の形成方法及び光学接続部品の製造方法

Title:

高分子材料被膜の形成方法及び光学接続部品の製造方法

Document Type and Number:

Japanese Patent JP4547034

Kind Code:

B2

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Inventors:

Tomoe Furue
Ken Sukegawa
Kyoichi Sasaki
Suzuki Masayoshi

Application Number:

JP2009193591A

Publication Date:

September 22, 2010

Filing Date:

August 24, 2009

Export Citation:

Assignee:

Tomagawa Paper Mill Co., Ltd.

International Classes:

G02B6/255; G02B6/26

Domestic Patent References:

Attorney, Agent or Firm:

Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama

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