Title:
反応性被膜の形成方法
Document Type and Number:
Japanese Patent JP2006510774
Kind Code:
A
Abstract:
The invention relates to a method for forming coatings on an inorganic or organic substrate and to substrates coated in accordance with the method. In the method: a) a low-temperature plasma, a corona discharge, high-energy radiation and/or a flame treatment is caused to act on the inorganic or organic substrate, b) 1.) at least one activatable initiator or 2.) at least one activatable initiator and at least one ethylenically unsaturated compound is/are applied in the form of a melt, solution, suspension or emulsion to the inorganic or organic substrate, there being incorporated in the activatable initiator and/or the ethylenically unsaturated compound at least one group that interacts with a subsequently applied coating or reacts with groups contained therein, with the effect of promoting adhesion, and c) the coated substrate is heated and/or is irradiated with electromagnetic waves and an adhesion promoter layer is formed, d) the substrate so pretreated is provided with the further coating which contains reactive groups that react with those of the adhesion promoter layer and/or interact with the adhesion promoter layer.
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Inventors:
Kuntz, Martin
Michael, bower
Balany, Andreas
Michael, bower
Balany, Andreas
Application Number:
JP2004561494A
Publication Date:
March 30, 2006
Filing Date:
December 15, 2003
Export Citation:
Assignee:
Ciba Specialty Chemicals Holding Inc.
International Classes:
C08J7/04; B05D3/06; B05D3/14; C08J7/16; C09J5/02; B05D1/42; C08L101/00
Domestic Patent References:
| JPH04234441A | 1992-08-24 | |||
| JPH09176349A | 1997-07-08 | |||
| JPH0977891A | 1997-03-25 | |||
| JPH10101827A | 1998-04-21 | |||
| JP2002528568A | 2002-09-03 | |||
| JP2003522021A | 2003-07-22 | |||
| JP2000230159A | 2000-08-22 | |||
| JPH10511600A | 1998-11-10 | |||
| JP2005515889A | 2005-06-02 |
Attorney, Agent or Firm:
Hajime Tsukuni
Fumio Shinoda
Koshiro Tsukuda
Fumio Shinoda
Koshiro Tsukuda