Title:
METHOD OF FORMING REFERENCE MARK
Document Type and Number:
Japanese Patent JP2023061572
Kind Code:
A
Abstract:
To provide a method for forming a reference mark, capable of easily forming a reference mark on a wafer without using a photoresist and a mask.SOLUTION: A method for forming a reference mark includes: a processing device preparation step; a holding step of holding a wafer 38 on a chuck table; a center-coordinates calculation step of imaging at least three locations on the outer periphery of the wafer 38 by imaging means to obtain center coordinates of the wafer 38; a wafer-coordinates axis setting step of setting an axis connecting the center coordinates and an orientation mark 40, as a y-coordinates axis of the wafer 38 and setting an axis passing the center coordinates and being orthogonal to the y-coordinates axis, as an x-coordinates axis of the wafer 38; a reference mark coordinates setting step of setting the coordinates of a position where a reference mark 46 is formed; and a reference mark forming step of positioning processing means 6 on coordinates set in the reference mark coordinates setting step, and forming the reference mark 46.SELECTED DRAWING: Figure 8
Inventors:
OMAE MAKIKO
MIYATA SATOSHI
KOHINATA KYOSUKE
MIYATA SATOSHI
KOHINATA KYOSUKE
Application Number:
JP2021171564A
Publication Date:
May 02, 2023
Filing Date:
October 20, 2021
Export Citation:
Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
H01L21/301; B24B19/00; B24B49/12
Attorney, Agent or Firm:
Naozumi Ono
Okunuki Sachiko
Tsuyoshi Tsukano
Yoshifumi Kaneko
Okunuki Sachiko
Tsuyoshi Tsukano
Yoshifumi Kaneko
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