Title:
レジストパターンの形成方法および垂直磁気記録ヘッドの製造方法
Document Type and Number:
Japanese Patent JP4597902
Kind Code:
B2
Abstract:
Provided is a method of forming a photoresist pattern enabling the three dimensional shape of a photoresist pattern to be controlled sufficiently. A photoresist pattern for forming a main magnetic pole layer can be formed by forming a preparatory photoresist pattern having a projected part at a position corresponding to a flare point by selectively exposing and developing a photoresist film, and then heating the preparatory photoresist pattern. In the heating process, the presence of the projected part in the preparatory photoresist pattern relaxes the influence of thermal contraction, and hence the photoresist film is hard to be rounded at the position. Moreover, in the heating process, the preparatory photoresist pattern can be thermally flown and thermally contracted, so that the internal wall in the opening part can be inclined and the projected part can be retreated. Thus, the three dimensional shape of the photoresist pattern approaches a desired three dimensional shape.
Inventors:
Satoshi Ueshima
Application Number:
JP2006105343A
Publication Date:
December 15, 2010
Filing Date:
April 06, 2006
Export Citation:
Assignee:
tdk Corporation
International Classes:
G03F7/20; G03F1/00; G03F1/70; G03F7/40; G11B5/31
Domestic Patent References:
| JP2001194769A | ||||
| JP2002217087A | ||||
| JP200555537A | ||||
| JP200639258A | ||||
| JP2005242004A | ||||
| JP200454052A | ||||
| JP2002197613A | ||||
| JP2004294732A | ||||
| JP20026472A |
Attorney, Agent or Firm:
Yasushi Santanzaki
Yoichiro Fujishima
Yoichiro Fujishima