Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
Japanese Patent JPS61239982
Kind Code:
A
Abstract:

PURPOSE: To form a high resolving power resist pattern by a dry planographic printing system, by using dry planographic printing ink containing a resin component, a metal chelating resin, a polymerizable compound and a fluorocarbon type surfactant and/or a silicone surfactant and curing the printing pattern formed by said ink by the irradiation of active energy rays and/or heating.

CONSTITUTION: Dry planographic printing ink capable of being cured by the irradiation of active energy rays and/or heating containing at least one resin selected from a group consisting of an alkyd resin, a modified alkyd resin, a fatty acid modified epoxy resin, urethane oil and maleinated oil, a metal chelating resin obtained by reacting a metal compound B forming a ligand bond by using the ligand of the resin component A, a polymerizable compound having two or more of ethylenic unsaturated double bond B in one molecule thereof and a fluorocarbon type surfactant and/or a silicone type surfactant is used to print a predetermined pattern on a substrate by a dry planographic printing system and said printing pattern is cured by the irradiation of active energy rays and/or heating.


Inventors:
YASUI TOSHIHIKO
HISAMATSU HIROYOSHI
YAMAZAKI MASAHIKO
YAMASHITA SHIYOUZOU
Application Number:
JP6289385A
Publication Date:
October 25, 1986
Filing Date:
March 27, 1985
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DAINIPPON INK & CHEMICALS
International Classes:
B41M1/26; B41M5/00; C08F2/00; C08F2/48; H05K3/00; (IPC1-7): B41M5/00; C08F2/48
Attorney, Agent or Firm:
Takahashi victory