Title:
周期的堆積プロセスによって基材上に遷移金属含有膜を形成する方法、遷移金属ハロゲン化物化合物を反応チャンバーに供給する方法、及び関連蒸着装置
Document Type and Number:
Japanese Patent JP7391857
Kind Code:
B2
Abstract:
A method of forming a transition metal containing films on a substrate by a cyclical deposition process is disclosed. The method may include: contacting the substrate with a first vapor phase reactant comprising a transition metal halide compound comprising a bidentate nitrogen containing adduct ligand; and contacting the substrate with a second vapor phase reactant. A method for supplying a transition metal halide compound comprising a bidentate nitrogen containing ligand to a reaction chamber is disclosed, along with related vapor deposition apparatus.
Inventors:
Timo Hatampa
Kacha Weinen
Mikko Ritara
Marook Resquera
Kacha Weinen
Mikko Ritara
Marook Resquera
Application Number:
JP2020543099A
Publication Date:
December 05, 2023
Filing Date:
February 11, 2019
Export Citation:
Assignee:
AS MIP Holding B F
International Classes:
C23C16/455; C23C16/18; C23C16/40; H01L21/3205; H01L21/768; H01L23/532
Domestic Patent References:
| JP2006511716A |
Foreign References:
| US20120058270 | ||||
| US20060141155 |
Other References:
MARISSA M. KERRIGAN,LOW TEMPERATURE, SELECTIVE ATOMIC LAYER DEPOSITION OF COBALT METAL FILMS USING,CHEMISTRY OF MATERIALS,2017年08月16日,V29 N17,P7458-7466,SR引用文献
JINHEE KWON,SUBSTRATE SELECTIVITY OF (TBU-ALLYL)CO(CO)3 DURING THERMAL ATOMIC LAYER DEPOSITION OF COBALT,CHEMISTRY OF MATERIALS,2012年02月28日,V24 N6,P1025-1030,SR引用文献
THONG Q. NGO,ATOMIC LAYER DEPOSITION OF PHOTOACTIVE COO/SRTIO3 AND COO/TIO2 ON SI(001) FOR VISIBLE,JOURNAL OF APPLIED PHYSICS,米国,2013年08月28日,V114 N8,P084901/1-8,SR引用文献
AJAY V. GOLE ET AL,Preparation of Nickel Sulfide Thin Films and Nanocrystallites Using Nickel Furfuraldehyde Thiosemicarbazone as Single-Source Precursor,ADVANCED MATERIALS RESEARCH,2011年11月01日,vol.383-390,P3828 - 3834,SR引用文献
Barreca et al.,Cobalt oxide nanomaterials by vapor phase synthesis for fast and reversible lithium storage,J Phys Chem C 2010,2010年05月06日,114,P 10054-10060,SR引用文献
JINHEE KWON,SUBSTRATE SELECTIVITY OF (TBU-ALLYL)CO(CO)3 DURING THERMAL ATOMIC LAYER DEPOSITION OF COBALT,CHEMISTRY OF MATERIALS,2012年02月28日,V24 N6,P1025-1030,SR引用文献
THONG Q. NGO,ATOMIC LAYER DEPOSITION OF PHOTOACTIVE COO/SRTIO3 AND COO/TIO2 ON SI(001) FOR VISIBLE,JOURNAL OF APPLIED PHYSICS,米国,2013年08月28日,V114 N8,P084901/1-8,SR引用文献
AJAY V. GOLE ET AL,Preparation of Nickel Sulfide Thin Films and Nanocrystallites Using Nickel Furfuraldehyde Thiosemicarbazone as Single-Source Precursor,ADVANCED MATERIALS RESEARCH,2011年11月01日,vol.383-390,P3828 - 3834,SR引用文献
Barreca et al.,Cobalt oxide nanomaterials by vapor phase synthesis for fast and reversible lithium storage,J Phys Chem C 2010,2010年05月06日,114,P 10054-10060,SR引用文献
Attorney, Agent or Firm:
Yasuhiko Murayama
Shinya Mihiro
Tatsuhiko Abe
Shinya Mihiro
Tatsuhiko Abe