PURPOSE: To provide a method and device for generating plasma, which has high density and excellent uniformity of the plasma under high vacuum, thereby improves fine workability, and minimizes the damage to a device.
CONSTITUTION: A sample base 2 is arranged in a lower part inside a vacuum chamber, a counter electrode (not shown in fig.) opposed to the sample base 2 is arranged over the sample base 2 in the vacuum chamber. Side electrodes 4, 5, 6 are arranged on the side of a space between the sample base 2 and the counter electrode so as to peripherally surround the space and to make lower ends of the side electrodes nearly flush with the upper face of the sample base 2. High frequency power having the same frequency and successively differed in phase in the circumferential direction is applied to each side electrode 4, 5, 6, and a rotating field for making electrons in a plasma generating part 20 rotating motion is excited in the plasma generating part 20 surrounded by the sample base 2, the counter electrode and each side electrode 4, 5, 6.
TAMAOKI NORIHIKO
KUBOTA MASABUMI
NOMURA NOBORU
FUKUTO KENJI
NAKAYAMA ICHIRO
