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Title:
METHOD FOR HEAPING OF LIQUID SUBSTANCE ON SURFACE OF SQUARE SUBSTRATE AND OUTFLOW NOZZLE FOR SQUARE SUBSTRATE
Document Type and Number:
Japanese Patent JPH06338449
Kind Code:
A
Abstract:

PURPOSE: To keep a liquid substance in a required minimum quantity on the surface of a square substrate with good thickness uniformity and in a state that the liquid substance is not scattered.

CONSTITUTION: A liquid substance L is flowed out in a state of a film flow from a slender slit-shaped opening part 4 which has been formed in a front plate for a rectangular parallelepiped box body 1 which constitutes an outflow nozzle, and the liquid substance is heaped on the surface of a substrate 9. The outflow nozzle is provided with a guide member 2 having a sliding face which has been swollen and curved to the obliquely upper part, with both end- regulation parts 5 formed at both ends in a first direction along the slicing face and with a laminar-flow formation member installed at the inside of the box body 1, and the outflow nozzle makes a prescribed film flow out from the opening part 4. The height of the opening part 4 is set at a prescribed value to achieve the film flow by taking into consideration the total amount of the liquid substance L to be heaped on the substrate 9, the viscosity of the liquid substance L and the like.


Inventors:
YANAGISAWA SHINTARO
Application Number:
JP15139993A
Publication Date:
December 06, 1994
Filing Date:
May 28, 1993
Export Citation:
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Assignee:
CHUO RIKEN KK
International Classes:
B05C5/00; G03F7/30; H01L21/027; H05K3/00; (IPC1-7): H01L21/027; B05C5/00; G03F7/30
Domestic Patent References:
JPS57192955A1982-11-27
JPS6089925A1985-05-20
JPH0350550A1991-03-05
JPH04124812A1992-04-24
Attorney, Agent or Firm:
Koichi Hotate