Title:
METHOD OF IMPROVING MOUNTING POSITION OF SPECIFIC RESISTANCE MEASUREMENT SENSOR IN ULTRAPURE WATER MAKING APPARATUS
Document Type and Number:
Japanese Patent JP2003315297
Kind Code:
A
Abstract:
To provide a method of improving the mounting position of a specific resistance measurement sensor which does not cause contamination of ultrapure water when the sensor is mounted.
The method of improving the mounting position of the specific resistance measurement sensor is characterized in that it is provided with a bypass line with a check valve in the vicinity of an outlet of ultrapure water which is produced, and the specific resistance measurement sensor is placed within the bypass line when a specific resistance in the ultrapure water produced by an ultrapure water making apparatus is measured.
Inventors:
KOBAYASHI TOMOAKI
Application Number:
JP2002116424A
Publication Date:
November 06, 2003
Filing Date:
April 18, 2002
Export Citation:
Assignee:
SANTOKU CHEMICAL
International Classes:
G01N27/06; B01D61/02; B01D61/14; B01D61/58; C02F1/32; C02F1/42; C02F1/44; C02F9/00; (IPC1-7): G01N27/06; B01D61/02; B01D61/14; B01D61/58; C02F1/32; C02F1/42; C02F1/44; C02F9/00
Attorney, Agent or Firm:
Shunichiro Suzuki (3 others)
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