Title:
METHOD FOR INSPECTING DUST ON RETICULE
Document Type and Number:
Japanese Patent JPH05257265
Kind Code:
A
Abstract:
PURPOSE: To improve the sensitivity of dust detection in the method for inspecting the dust on a reticule.
CONSTITUTION: A wafer 6 coated with a positive resist is first exposed using the inversion pattern reticule 3. The wafer 6 is thereafter exposed again using the normal reticule 1. The wafer 6 is then developed, by that, the resist only on the pattern of the dust on the normal reticule 1 is made to remain as the resist 7 on the wafer 6. This wafer 6 is detected by a dust inspecting device, by that the dust 2 on the reticule 1 is detected with the good sensitivity.
Inventors:
Takatoshi Fujimoto
Application Number:
JP5204792A
Publication Date:
October 08, 1993
Filing Date:
March 11, 1992
Export Citation:
Assignee:
Kansai NEC Corporation
International Classes:
G03F1/84; H01L21/66; (IPC1-7): G03F1/08; H01L21/66