Title:
METHOD FOR INSPECTING FILM THICKNESS AND DEVICE FOR INSPECTING FILM THICKNESS
Document Type and Number:
Japanese Patent JPH05142524
Kind Code:
A
Abstract:
PURPOSE:To enable the easy inspection of the film thicknesses of a color filter layer and top coat layer with high accuracy by irradiating the rear surface of a glass substrate formed with a thin film on the surface with polarized inspecting light and detecting the fluctuation in the thickness of a thin film by interference fringes. CONSTITUTION:The device for inspecting film thicknesses constituted by having a light source 5 disposed on the rear surface of the glass substrate 2 formed with the light transparent thin film 1 on the surface and disposing a polarizing plate 6 between the glass substrate 2 and the light source 5 is used. The rear surface of the glass substrate 2 is irradiated with the polarized inspecting light 51 and the fluctuation in the film thickness of the thin film 1 is detected by the interference fringes 52 formed on the surface of the thin film 1. Namely, the rear surface of the glass substrate 2 is irradiated with the polarized inspecting light 51, by which the polarized inspecting light 51 transmitted through the thin film 1 and the polarized inspecting light 51 repeating reflections in the thin film 1 are interfered with each other and the interference fringes 52 are formed on the surface of the thin film 1. Since the intervals and color tones of the interference fringes 51 change in correspondence to a very slight difference in the film thickness and, therefore, the delicate fluctuation in the film thickness is detected with high accuracy.
More Like This:
Inventors:
ARAI KAORU
YAMAZAKI SEIICHI
YAMAZAKI SEIICHI
Application Number:
JP30287391A
Publication Date:
June 11, 1993
Filing Date:
November 19, 1991
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G02F1/1333; (IPC1-7): G02F1/1333
Attorney, Agent or Firm:
Teiichi