PURPOSE: To perform nondestructive indirect inspection of photomasks with high accuracy in a method for inspecting the shapes and demensions of photomask patterns by manufacturing the transfer mold for the masks and measuring this.
CONSTITUTION: An org. solvent of methyl acetate or the like is dropped on a photomask 1 wherein patterns 1a, 1b, 1c consisting of vapor-deposited films are respectively formed on a light transmittable glass plate, whereby a uniform org. film 3 is formed, and acetyl cellulose 4 of 0.02mmW0.08mm is brought into tight contact with this, whereby a mask pattern transfer mold is made. This mold is stripped. Next, a conductive vapor-deposited metallic film with 50W750 thicknesses is formed on the transfer surface of this transfer mold, and this vapor- deposited film is observed and photographed with an electron microscope under the conditions of 5W25kV acceleration voltage, and 1×10-10W3×10-11μ A and therefore products can be manufactured by using the mask to be measured, and the correlations with this can be compared, thus the decision of products is made easy and the products are measured with good accuracy.
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MISUMI AKIRA
ODAWARA KOUZOU
