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Title:
METHOD OF CORRECTING/REPAIRING LITHOGRAPHY PROJECTION TARGET INSTRUMENT
Document Type and Number:
Japanese Patent JP2013058801
Kind Code:
A
Abstract:

To provide a method of correcting/repairing a projection target instrument of a lithography projection exposure apparatus.

The method of correcting/repairing a projection target instrument of a lithography projection exposure apparatus (10) including a plurality of optical elements, each containing at least one first optica element having a refractive power, between an object plane (12) and an image plane (16) includes the steps of: removing at least one first optical element from the projection target instrument in the field without replacing all optical elements; inserting at least one first preliminary optical element into the projection target instrument at the position of at least one first optical element; and adjusting the image quality of the projection target instrument to a desired quality.


Inventors:
OLAF ROGALSKY
BORIS BITTNER
PETASCH THOMAS
JOCHEN HAEUSSLER
Application Number:
JP2012269465A
Publication Date:
March 28, 2013
Filing Date:
December 10, 2012
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH
International Classes:
H01L21/027; G02B19/00
Domestic Patent References:
JP2007266186A2007-10-11
JP2006245085A2006-09-14
JP2002250865A2002-09-06
JPH11176744A1999-07-02
JP2007515797A2007-06-14
JP2005202375A2005-07-28
JP2002324752A2002-11-08
JP2002324752A2002-11-08
JP2002250865A2002-09-06
JPH11176744A1999-07-02
JP2005202375A2005-07-28
JP2007266186A2007-10-11
JP2006245085A2006-09-14
JP2007515797A2007-06-14
Foreign References:
WO2003007045A12003-01-23
WO2006059636A12006-06-08
WO2003007045A12003-01-23
WO2006059636A12006-06-08
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda



 
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