Title:
METHOD FOR MANAGING CONCENTRATION OF PLATING LIQUID FOR MAGNETIC FILM
Document Type and Number:
Japanese Patent JP2003107005
Kind Code:
A
Abstract:
To provide a method for managing a concentration of a plating liquid for magnetic films whereby a Co ion concentration in the plating liquid can be correctly analyzed to enable at least a composition control for an alloy including Fe and Co.
A sample liquid of analyzing the Co ion concentration which is collected from a plating liquid is diluted, and a complexing agent which can be coordinated with Co ions is added to the diluted sample liquid. The concentration of Co ions in the sample liquid is analyzed from an absorbance of a peak wavelength of Co ions in a visible region of light.
Inventors:
ASAI HIROKI
Application Number:
JP2001302176A
Publication Date:
April 09, 2003
Filing Date:
September 28, 2001
Export Citation:
Assignee:
MATSUSHITA ELECTRIC IND CO LTD
International Classes:
G01N31/00; C25D7/00; C25D21/12; C25D21/14; G01N21/27; G01N21/78; (IPC1-7): G01N21/78; C25D7/00; C25D21/12; C25D21/14; G01N21/27; G01N31/00
Attorney, Agent or Firm:
Aoyama Ryo (2 outside people)