METHOD FOR MANUFACTURING ANION EXCHANGE RESIN, ANION EXCHANGE, MIXED BED RESIN AND METHOD FOR MANUFACTURING ULTRAPURE WATER FOR CLEANING ELECTRIC APPLIANCE/MATERIAL

Title:

METHOD FOR MANUFACTURING ANION EXCHANGE RESIN, ANION EXCHANGE, MIXED BED RESIN AND METHOD FOR MANUFACTURING ULTRAPURE WATER FOR CLEANING ELECTRIC APPLIANCE/MATERIAL

Document Type and Number:

Japanese Patent JP2008264670

Kind Code:

A

Abstract:

To provide an anion exchange resin which develops little eluate and hardly deteriorates the even degree of the surface of a silicon wafer.

The method for manufacturing the anion exchange resin includes the process of contacting a water-soluble polymer containing an anionic dissociation group, while the amount of contact of the water-soluble polymer is 0.01-10 mmol/L as the amount of the anionic dissociation group of the water-soluble to the anion exchange of 1 litter, and the even degree Rms of the surface of the wafer is 4 or less which is requested by a silicon wafer test for the obtained anion exchange resin.

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Inventors:

FUKUI NAGAO
MIZUNIWA TETSUO
TOKUNAGA KAZUHIKO
YASUTOMI MASAKO

Application Number:

JP2007110654A

Publication Date:

November 06, 2008

Filing Date:

April 19, 2007

Export Citation:

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Assignee:

KURITA WATER IND LTD
MITSUBISHI CHEM CORP

International Classes:

B01J41/12; B01J47/04; C02F1/42; C08J5/20

Domestic Patent References:

JP2002102719A	2002-04-09
JPH10202118A	1998-08-04
JPS50130688A	1975-10-16

Attorney, Agent or Firm:

Tsuyoshi Shigeno

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