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Title:
METHOD FOR MANUFACTURING AQUEOUS SOLUTION CONTAINING INDIUM HAVING DECREASED METAL IMPURITIES
Document Type and Number:
Japanese Patent JP2004131355
Kind Code:
A
Abstract:

To provide a method for manufacturing an aqueous solution containing indium having decreased metal impurities from an aqueous solution containing indium and the metal impurities in a simple manner and a method for decreasing the metal impurities of the aqueous solution containing the indium in a simple manner.

The aqueous solution is manufactured by bringing a raw aqueous solution containing the indium and the metal impurities and having a hydrogen ion concentration ranging from ≥1 to ≤12mol/L into contact with an anion exchange resin having a tertiary amino group as an exchange group. Also, the aqueous solution containing the indium and the metal impurities is decreased in the metal impurities by bringing the raw aqueous solution having the hydrogen ion concentration ranging from ≥1 to ≤12mol/L into contact with the anion exchange resin having the tertiary amino group as the exchange group.


Inventors:
HATTORI TAKESHI
FUJIWARA SHINJI
SAEGUSA KUNIO
TAKEDA KUNIHIKO
Application Number:
JP2002300079A
Publication Date:
April 30, 2004
Filing Date:
October 15, 2002
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C01G15/00; (IPC1-7): C01G15/00
Attorney, Agent or Firm:
Takashi Kuboyama
Toru Nakayama
Masayuki Enomoto