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Patent Searching and Data


Title:
METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2014075565
Kind Code:
A
Abstract:

To attain high thermal conductivity in a GaN substrate for high voltage driving element.

After forming an element by forming a GaN element on a sapphire substrate, a glass substrate is stuck to the element surface via a UV peelable material. Subsequently, the sapphire substrate and a GaN layer are removed by laser irradiation. Thereafter, the back side of the GaN element thus removed is metallized and a heat sink substrate is stuck thereto. Under that state, the glass surface is irradiated with UV light, thus removing the glass substrate. Consequently, a GaN element is formed on a heat sink. Since the heat sink substrate has a two-layer structure of a conductive heat sink material, and an insulating material, the element potential and the lead frame potential can be isolated.


Inventors:
KATO MITSUHARU
Application Number:
JP2012234182A
Publication Date:
April 24, 2014
Filing Date:
October 04, 2012
Export Citation:
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Assignee:
MTEC KK
International Classes:
H01L21/338; H01L21/02; H01L21/337; H01L27/098; H01L27/12; H01L29/808; H01L29/812