To provide a method of manufacturing diffuse reflection plate used for a reflection type liquid crystal display device that does not require a backlight, a solar cell that requires high efficiency, or the like, and to provide a transfer film used in the method of manufacturing diffuse reflection plate.
The method of manufacturing diffuse reflection plate comprises: a step of attaching, on the surface of the substrate, a transfer film in which a thin film layer is laminated on a temporary support provided with a rugged shaped surface capable of diffusing light, another surface not laminated on the temporary support of the thin film layer constitutes an adhesion surface to a substrate to be transferred, the thin film layer is a photo-setting resin composition and further has an operation that fluidizes and flattens when being heated at the softening temperature or higher; a step of exposing the thin film layer with a mask; a step of flattening a rugged shape of the thin film layer of an unexposed part by heating the substrate; and a step of forming a reflective film on the thin film layer.
YOSHIDA TAKESHI
TSURUOKA YASUO
KIZAWA KEIKO
| JPH07199166A | 1995-08-04 | |||
| JPH08142597A | 1996-06-04 | |||
| JPH0717198A | 1995-01-20 | |||
| JPH10319391A | 1998-12-04 | |||
| JPH10282315A | 1998-10-23 |