Title:
METHOD OF MANUFACTURING DISPLAY ELEMENT AND METHOD OF MANUFACTURING SUBSTRATE FOR DISPLAY ELEMENT
Document Type and Number:
Japanese Patent JP3770225
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve the accuracy of patterning while maintaining characteristics, such as low cost, high throughput and a high degree of freedom of optical materials in a display element and its method of manufacturing.
SOLUTION: A display substrate is subjected to plasma treatment by generating the plasma using raw materials, such as O2, CF4 and Ar, by which a desired distribution of liquid repellency and lyophilicity can be formed. The liquid optical material is thereafter applied thereto by using an ink jet method or the like.
Inventors:
Mutsumi Kimura
Hiroshi Kiguchi
Hiroshi Kiguchi
Application Number:
JP2002330875A
Publication Date:
April 26, 2006
Filing Date:
September 18, 1997
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
B41J2/01; G09F9/00; G02F1/1335; G09F9/30; H01L27/32; H01L51/50; H05B33/10; H05B33/12; H05B33/14; H05B33/22; (IPC1-7): G09F9/00; B41J2/01; G02F1/1335; G09F9/30; H05B33/10; H05B33/12; H05B33/14; H05B33/22
Domestic Patent References:
| JP3229886A | ||||
| JP3250583A | ||||
| JP7192867A | ||||
| JP7235378A | ||||
| JP8060372A | ||||
| JP8179113A | ||||
| JP8179307A | ||||
| JP8188658A | ||||
| JP8188663A |
Attorney, Agent or Firm:
Atsushi Mitsuda