Title:
METHOD OF MANUFACTURING FILM DEPOSITION MASK, AND FILM DEPOSITION MASK
Document Type and Number:
Japanese Patent JP2015120947
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To facilitate control over the tilt angle of a side wall of an opening pattern.SOLUTION: There is provided a method of forming a film deposition mask in which an opening pattern 4 which is polygonal in plan view is formed by irradiating a resin-made film 20 with laser light L. The opening pattern 4 which has an opening inclined to widen toward a side of an irradiation surface for the laser light L and has at least a pair of opposite side walls 4a is formed by irradiating the film 20 with the laser light L shaped using a beam shaping mask 10 which has a light transmission window 18 that the laser light passes through and is gradually decreased in light transmissivity at least in sideward regions of a pair of sides outside the light transmission window 18 laterally from an edge part of the light transmission window.
Inventors:
MIZUMURA MICHINOBU
Application Number:
JP2013264326A
Publication Date:
July 02, 2015
Filing Date:
December 20, 2013
Export Citation:
Assignee:
V TECHNOLOGY CO LTD
International Classes:
C23C14/04
Domestic Patent References:
| JP2013108143A | 2013-06-06 | |||
| JP2012035294A | 2012-02-23 | |||
| JP2013147739A | 2013-08-01 | |||
| JP2013165060A | 2013-08-22 | |||
| JP2010188418A | 2010-09-02 | |||
| JP2013165058A | 2013-08-22 |
Attorney, Agent or Firm:
Moriaki Ogawa
Haruyuki Nishiyama
Shoichi Okuyama
Haruyuki Nishiyama
Shoichi Okuyama
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