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Title:
METHOD OF MANUFACTURING FINE STRUCTURE
Document Type and Number:
Japanese Patent JP2011003672
Kind Code:
A
Abstract:

To provide a resin composition for nano-imprinting, softening at a low temperature and favorable in preservation stability.

The resin composition for nano-imprinting contains: a cationic polymerization compound which is crystalline and solid at normal temperatures; and a photo cationic polymerization initiator.


Inventors:
SAITO GIICHI
Application Number:
JP2009144608A
Publication Date:
January 06, 2011
Filing Date:
June 17, 2009
Export Citation:
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Assignee:
CANON KK
International Classes:
H01L21/027; B29C59/02; C08G59/24; C08G59/68
Domestic Patent References:
JP2009286843A2009-12-10
JP2010032991A2010-02-12
JP2007522531A2007-08-09
JPH0892231A1996-04-09
JP2002138130A2002-05-14
JP2002338656A2002-11-27
JP2004035762A2004-02-05
JP2006307011A2006-11-09
JP2008142940A2008-06-26
JP2004346115A2004-12-09
Foreign References:
WO2008005208A22008-01-10
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa



 
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