METHOD FOR MANUFACTURING FINE THREE-DIMENSIONAL STRUCTURE AND X-RAY MASK USED THEREFOR

Title:

METHOD FOR MANUFACTURING FINE THREE-DIMENSIONAL STRUCTURE AND X-RAY MASK USED THEREFOR

Document Type and Number:

Japanese Patent JP2007079458

Kind Code:

A

Abstract:

To provide a method for manufacturing a fine three-dimensional structure for easily manufacturing a fine three-dimensional structure having a predetermined form, and to provide an X-ray mask to be used for the method.

An X-ray absorbent 25 is deposited with various thicknesses in a direction of transmitting X-rays, which results in various transmission quantities of X-rays in a resist layer 22 in the projection region of the X-ray absorbent 25 depending on the thickness of the X-ray absorbent 25 in the transmission direction of X-rays, and changes the X-ray dose (X-ray absorption) irradiating the surface of the resist layer 22. Therefore, by removing the exposed portion of the resist layer 22 by development, a fine three-dimensional structure 27 of a predetermined form having a smooth slope without steps corresponding to the dose of X-rays can be obtained.

Inventors:

HATTORI TADASHI
ITOIGAWA KOICHI
UENO HIROSHI
UEDA HIROYASU

Application Number:

JP2005270532A

Publication Date:

March 29, 2007

Filing Date:

September 16, 2005

Export Citation:

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Assignee:

NEW IND RES ORGANIZATION

International Classes:

G03F7/20; B81C99/00; G03F1/22

Domestic Patent References:

JP2002258490A	2002-09-11
JPH09260258A	1997-10-03
JPH11111614A	1999-04-23
JP2005121865A	2005-05-12

Attorney, Agent or Firm:

Hironobu Onda
Makoto Onda

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