Title:
METHOD FOR MANUFACTURING FLOATING TYPE MAGNETIC HEAD
Document Type and Number:
Japanese Patent JP2002015412
Kind Code:
A
Abstract:
To enhance shape accuracy of a resist pattern and to appropriately form a desired floating pattern by appropriately and simply suppressing exposure by mistake at a resist later.
A pattern mask 34 having a light reducing pattern 38 for reducing light quantity of exposure light L1, provided in a position corresponding to a part where the exposure light L1 is reflected to generate exposure by mistake, for example, in an inclined surface 22a of an upper layer core 22 of a magnetic head element, is used as the pattern mask 34 when a resist layer 33 is exposed.
Inventors:
SASAKI MASAYUKI
MINAMI HIROYUKI
AKAMA HIROSHI
MINAMI HIROYUKI
AKAMA HIROSHI
Application Number:
JP2000195066A
Publication Date:
January 18, 2002
Filing Date:
June 28, 2000
Export Citation:
Assignee:
SONY CORP
International Classes:
G11B5/31; G11B5/39; G11B5/60; G11B21/21; (IPC1-7): G11B5/60; G11B5/31; G11B5/39; G11B21/21
Attorney, Agent or Firm:
Akira Koike (2 outside)
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