Title:
METHOD FOR MANUFACTURING FUNCTIONAL NAIL POLISH CONTAINING HOLLOW FILLER AND POROUS FILLER
Document Type and Number:
Japanese Patent JP2023173169
Kind Code:
A
Abstract:
To provide a method for manufacturing a nail polish with improved physical properties of a base coating agent and a top coating agent, plasticity adapted to the curved form of the nail, physical abrasion resistance to friction, and heat resistance by preventing thermal deformation in a thermal environment, and the like, in nail polish consisting of an organic polymer base coat layer and top coat layer.SOLUTION: A method for manufacturing a nail polish consisting of an organic polymer base coat layer and top coat layer, includes the steps of: adding a filler consisting of hollow fine particles of inorganic silica-based glass bubbles surface-modified with 3-(2-amino ethyl amino)-propyltrimethoxysilane (APTMS) to a base coating agent; and adding a porous filler having cavities made of an inorganic ceramic-based organic-inorganic hybrid to a top coating agent.SELECTED DRAWING: Figure 4
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Inventors:
KIM YOUNG SOO
Application Number:
JP2022085235A
Publication Date:
December 07, 2023
Filing Date:
May 25, 2022
Export Citation:
Assignee:
KIM YOUNG SOO
International Classes:
A61K8/25; A61K8/02; A61K8/19; A61K8/72; A61Q3/02
Attorney, Agent or Firm:
Nobuyuki Yamaguchi