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Title:
METHOD FOR MANUFACTURING HOLLOW STRUCTURE, SUBSTRATE FOR MANUFACTURING HOLLOW STRUCTURE AND APPARATUS FOR MANUFACTURING HOLLOW STRUCTURE
Document Type and Number:
Japanese Patent JP2009214374
Kind Code:
A
Abstract:

To provide a method for manufacturing a hollow part structure suitable for precisely manufacturing a hollow structure in which pitch intervals of hollow parts are 30 m.

In the method for manufacturing the hollow structure, the hollow structure is manufactured by using a gas permeable material as a part of a material composed of a substrate 5 for manufacturing the hollow structure, confining a high pressure gas into the gas permeable material by impregnating the gas permeable material with the high pressure gas in advance under a high pressure condition, forming a plastic deformation film 10 on the surface 5a under a vacuum condition, and expanding and drawing the plastic deformation film 10 with the high pressure gas in respective recessed parts 5b while preventing invading of the plastic deformation material into the recessed parts 5b by venting the high pressure gas confined in the gas permeable material into respective recessed parts 5b.


Inventors:
KANEMATSU TOSHIHIRO
SENOO SHINYA
Application Number:
JP2008059170A
Publication Date:
September 24, 2009
Filing Date:
March 10, 2008
Export Citation:
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Assignee:
RICOH KK
International Classes:
B29D22/00; G02B3/00
Domestic Patent References:
JP2007098930A2007-04-19
JP2008018379A2008-01-31
JP2001315217A2001-11-13
JPS5651895B21981-12-08
JP2004086144A2004-03-18
JP2011504607A2011-02-10
Attorney, Agent or Firm:
Tamio Nishiwaki