Title:
METHOD FOR MANUFACTURING METALLIC MATERIAL WITH NANOCRYSTALLINE STRUCTURE, AND METALLIC MATERIAL WITH NANOCRYSTALLINE STRUCTURE
Document Type and Number:
Japanese Patent JP3879059
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a metallic material of nanocrystalline structure by which performance can be improved, e.g. strength can be improved by providing nanocrystalline structure to a formed body or structure of metallic material and also to provide a high-performance metallic material of nanocrystalline structure manufactured using the manufacturing method.
SOLUTION: The surface layer of the metallic material after forming is amorphized by cold working such as shot peening, and the resultant amorphized metallic material is subjected to low-temperature heat treatment to precipitate nanocrystals in the surface layer. In this way, the strength of e.g. light metals such as aluminum alloys can be increased by a simple method and the manufacture of the lightweight high-strength formed body or structure is made possible, and the resultant metallic material can be used, e.g. for the manufacture of aircraft parts, automotive frames, parts, and lightweight high-strength medical appliances such as artificial arms and the manufacture of various parts and structures with high strength and durability, such as switches.
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Inventors:
Higo Yakichi
Kazuki Takashima
Kazuki Takashima
Application Number:
JP2002000816A
Publication Date:
February 07, 2007
Filing Date:
January 07, 2002
Export Citation:
Assignee:
Foundation for Science and Engineering
International Classes:
C21D7/06; C21D1/04; C22F1/04; C22C45/08; C22F1/00; (IPC1-7): C22F1/04; C22F1/00
Domestic Patent References:
JP10265888A | ||||
JP11071661A | ||||
JP9509698A |
Other References:
LU K ,Surface Nanocrystallization(SNC) of Metallic Materials-Presentation of the Concept behind a New Approach. ,J Mater Sci Technol,1999年 3月,Vol.15 No.3,P.193-197
渡辺智ら,AE法による結晶粒超微細化用ショットピ-ニング装置の高効率条件の決定,アコースティック・エミッション総合コンファレンス論文集,2001年10月 2日,Vol.13th,P.83-86
渡辺智ら,AE法による結晶粒超微細化用ショットピ-ニング装置の高効率条件の決定,アコースティック・エミッション総合コンファレンス論文集,2001年10月 2日,Vol.13th,P.83-86
Attorney, Agent or Firm:
Saichi Suyama
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