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Title:
METHOD FOR MANUFACTURING METHACRYLIC RESIN HAVING HIGH IMPACT RESISTANCE
Document Type and Number:
Japanese Patent JP2003128729
Kind Code:
A
Abstract:

To provide a method for manufacturing a methacrylic resin having high impact resistance.

A composition consisting of 100 pts.wt. of methyl methacrylate and 5-50 pts.wt. of a specific compound is subjected to copolymerization in the presence of a thermal radical initiator. The copolymerization proceeds easily, and a resin having widely improved impact resistance without lowering transparency and having improved heat and chemical resistances is provided. The resin can be widely used as glazing materials, various covers, signboards, front plates for display such as PDP or a screen base board of a projector, etc.


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Inventors:
KAWASAKI NOBORU
SASAGAWA KATSUYOSHI
SHIOYA MASAHIRO
Application Number:
JP2001330099A
Publication Date:
May 08, 2003
Filing Date:
October 29, 2001
Export Citation:
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Assignee:
MITSUI CHEMICALS INC
International Classes:
C08F220/14; C08F212/34; (IPC1-7): C08F220/14; C08F212/34



 
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