To manufacture a microswitching element having a peeling electrode without increasing a manufacturing process.
A method of manufacturing the microswitching element comprises the steps of: forming a first driving electrode 21, a movable electrode 23a and a first peeling electrode 25 on a surface layer 13 of a substrate 10 on which the surface layer 13 is formed; removing the surface layer 13 at a part of the periphery of a region in which the first driving electrode 21 and the movable electrode 23a are formed, and thereby forming a groove part 14 for forming a cantilever 15; forming a second driving electrode 22 over the first driving electrode 21 with a certain space in between, forming a fixed electrode 24 over the movable electrode 23a with a certain space in between, and forming a second peeling electrode 23b over the first peeling electrode 25 with a certain space in between; and removing the substrate 10 from the inside of the groove part 14, and thereby forming the cantilever 15 supported in a support part, by the surface layer 13 which is separated from the groove part 14.
NAKATANI TADASHI
KATSUKI TAKASHI
Akinori Yamaguchi
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