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Title:
METHOD FOR MANUFACTURING PHOTOMASK, METHOD FOR TRANSFERRING PATTERN, AND METHOD FOR MANUFACTURING DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP2012212125
Kind Code:
A
Abstract:

To carry out patterning without requiring an additional investment even when a line-and-space pattern with a fine pitch is formed on an object to be processed.

A side etching width α is determined based on etching conditions for etching an object to be processed; a line width ML and a space width MS of a transfer pattern are determined based on the side etching width α and a line width WL and a space width WS of a film pattern; and exposure conditions to be applied upon exposure and a transmittance for light of a translucent film are determined so as to form a line-and-space film pattern having a line width WL and space width WS on the object to be processed by exposure using a photomask having a transfer pattern with the determined line width ML and space width MS and by etching.


Inventors:
YOSHIDA KOICHIRO
Application Number:
JP2012050414A
Publication Date:
November 01, 2012
Filing Date:
March 07, 2012
Export Citation:
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Assignee:
HOYA CORP
International Classes:
G03F1/70; G02F1/1368; G03F1/00; G03F1/54; G03F7/20
Domestic Patent References:
JP2007010845A2007-01-18
JP2006330691A2006-12-07
JP2009278055A2009-11-26
JP2009042753A2009-02-26
Attorney, Agent or Firm:
Aniya Setsuo
Toru Yui
Hitoshi Kiyono
Fukuoka Masahiro
Okuyama Tomohiro



 
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