Title:
高ドライエッチング耐性ポリマー層を付加したフォトマスクブランクスを用いたフォトマスクの製造方法
Document Type and Number:
Japanese Patent JP5700003
Kind Code:
B2
Inventors:
Yukihiro Fujimura
Junpei Morimoto
Asagi Asagi
Nobuhiro Shimizu
Hideyoshi Takamizawa
Junpei Morimoto
Asagi Asagi
Nobuhiro Shimizu
Hideyoshi Takamizawa
Application Number:
JP2012191585A
Publication Date:
April 15, 2015
Filing Date:
August 31, 2012
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
G03F1/80; G03F1/32; H01L21/3065
Domestic Patent References:
JP61138256A | ||||
JP62175739A | ||||
JP7049558A | ||||
JP2001053068A | ||||
JP2005055893A | ||||
JP2005509913A | ||||
JP2006048033A | ||||
JP2004090635A1 |
Attorney, Agent or Firm:
Hiromi Fujimasu