Title:
METHOD OF MANUFACTURING QUARTZ GLASS
Document Type and Number:
Japanese Patent JP3792105
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a fluorine-doped quartz glass having a high transmittance in a wavelength of 157 nm suitable for a F2 laser lithography.
SOLUTION: The manufacturing method comprises the steps wherein a porous quartz glass is formed by flame-hydrolysing the base material of the quartz glass; the porous quartz glass is heated in an atmosphere of an inert gas, then fluorine-doped in the atmosphere containing SiF4 of 1-20% at 1000-1200°C; the doped quartz glass is cleared at an elevated temperature in the above atmosphere; and the cleared glass is hydrogen-doped in the atmosphere containing a gaseous hydrogen at 200-300°C.
Inventors:
Zhou Zhonghua
Hiroto Ikuno
Hiroto Ikuno
Application Number:
JP2000157616A
Publication Date:
July 05, 2006
Filing Date:
May 29, 2000
Export Citation:
Assignee:
Toshiba Ceramics Co., Ltd.
International Classes:
C03B20/00; C03B8/04; C03B19/14; C03C3/06; H01L21/027; H01S3/034; (IPC1-7): C03B20/00; C03B8/04; C03C3/06; H01L21/027; H01S3/034
Domestic Patent References:
| JP8075901A | ||||
| JP6227827A |
Attorney, Agent or Firm:
Mitsuyuki Matsuyama
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