To provide a manufacturing technology of a resin product that excels in wear resistance, water repellency, and antifouling properties, and in which high adhesion is secured at a laminate interface of a top coat layer.
A silicon compound layer 18 and a fluorine compound layer 20 are sequentially laminated and formed on an undercoat layer 14 in a reaction chamber 28 of a vacuum condition by a plasma CVD method. In addition, a reaction of the first gas for deposition by a plasma CVD method and a reaction of the second gas for deposition by a plasma CVD method are made at the same time from the start of the introduction of a second gas for deposition to form the fluorine compound layer 20 in the reaction chamber 28 to a time when an amount of at least the part of the gas component in the reaction chamber 28 becomes zero by gradually decreasing an introduction amount of at least a part of a gas component of a first gas for deposition to form the silicon compound layer 18 into the reaction chamber 28.
MATSUI HIROTSUGU
WATANABE YUJI
| JPH10130844A | 1998-05-19 | |||
| JP2002082205A | 2002-03-22 | |||
| JP2010100905A | 2010-05-06 |
Masahiro Nakashima