To enhance exposure characteristics.
The exposure device comprises a light-emitting section (10) which emits EUV light by plasma excitation of predetermined atoms, a condensation section (20) which condenses the EUV light irradiated from the light-emitting section, an exposure section (30) which irradiates a substrate with the EUV light condensed by the condensation section through a mask, a first plasma position monitor (11a) which detects the light-emitting point of the EUV light in the light-emitting section, and a light-emitting section driver (13) which adjusts the position of the light-emitting section. A first amount of positional shift between the light-emitting point detected by the plasma position monitor and a light-emitting reference position is determined, and the light-emitting section driver is driven based on the first amount of positional shift. Furthermore, an exposure device is used which has a first condensation position monitor (21a) for detecting the position of condensation point of the EUV light condensed by the condensation section, and which has a condensation section driver (23) which adjusts the position of the condensation section. A second amount of positional shift between the condensation point and a reference condensation point is calculated, and the condensation section driver (23) is driven based on the calculation result of the second amount of positional shift.
Atsushi Sugada
Akiko Tsutsui
Toru Nakahara
Tetsuya Sakaji
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