To provide a technology of preventing ignition occurring during a maintenance operation for a thin-film-forming apparatus for forming a thin film made from a material active to oxygen.
This technology includes forming a metallic film MF1 containing oxygen on a target shield TGS, an exhaust shield EXS, a gas distribution plate GDB, a ring chuck RCK and the like, which are members composing the inner surface of a film-forming chamber of the thin-film-forming apparatus, or members arranged in the film-forming chamber, by previously thermal-spraying a metal on the surfaces. Thereby, when fine particles active to oxygen deposit on the surfaces of the members, oxygen in the metallic film MF1 diffuses into the deposited fine particles, and forms an oxide film OF1 to convert the fine particles active to oxygen, into an inactive state (chemically stable state).
| JPH05287519 | SPUTTERING DEVICE |
| JP2009179515 | In4Sn3O12 POLYCRYSTALLINE POWDER, SINTERED COMPACT THEREOF, AND METHOD FOR PRODUCING THOSE |
| JPH0892737 | SPUTTERING DEVICE |
MIYAMA YOSHIO
YAMAMOTO MASASHI
MITSUI KATSUHIRO
Next Patent: VAPOR DEPOSITION SOURCE AND VAPOR DEPOSITION APPARATUS