Title:
METHOD FOR MANUFACTURING SILICA FILM-LAMINATED FILM FOR GAS BARRIER
Document Type and Number:
Japanese Patent JP2008049601
Kind Code:
A
Abstract:
To provide a method for manufacturing a silica film-laminated film excellent in moistureproofness and gas barrier functionalities.
The method for manufacturing the silica film-laminated film for gas barrier comprises forming a coating film comprising a polysilane compound expressed by formula SinHm (wherein n is an integer of 3 and m is an integer of n to 2n+2) on a liquid metal, then forming a silica film on the liquid metal by applying oxidation treatment on the coating film, and furthermore, forming a coating of a resin solution on the silica film.
Inventors:
MATSUKI YASUO
Application Number:
JP2006228744A
Publication Date:
March 06, 2008
Filing Date:
August 25, 2006
Export Citation:
Assignee:
JSR CORP
International Classes:
B32B9/00; B32B27/00
Domestic Patent References:
| JP2004087546A | 2004-03-18 | |||
| JP2004204094A | 2004-07-22 | |||
| JP2003171556A | 2003-06-20 | |||
| JP2003055556A | 2003-02-26 | |||
| JPH04260623A | 1992-09-16 | |||
| JP2001002449A | 2001-01-09 |
Attorney, Agent or Firm:
Masataka Oshima