Method for manufacturing silicon

Japanese Patent JP5942899

B2

PROBLEM TO BE SOLVED: To provide a production method for producing silicon from machining scraps which is applicable to machining scraps containing no abrasive grains of silicon carbide and enables stable mass production.SOLUTION: A silicon production method includes a step of melting machining scraps produced in cutting or grinding a silicon ingot or a silicon wafer. In the melting step, the machining scraps are induction-heated in a condition where the maximum difference of elevation h of the liquid surface in the surface of molten silicon is 0.5 cm or larger. The melting step meets conditions: (1) 5-95 wt.%, relative to the total amount of molten silicon, of the machining scraps are molten in molten silicon formed by melting raw material silicon; and (2) the machining scraps are pricked with a jig in a state where the machining scraps are heated to a temperature equal to or higher than the melting point of silicon.

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Hiroyuki Ueno
Yukihiro Miyamoto
Toshiaki Katayama
Yoji Arita
Keiji Yamahara

JP2013039578A

June 29, 2016

February 28, 2013

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Mitsubishi Chemical Corporation

C01B33/02; B09B3/00; B09B5/00; C01B33/037; H01L31/04

JP2001526171A
JP2001048697A
JP2006027923A
JP10251007A

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