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Title:
METHOD FOR MANUFACTURING STENCIL MASK FOR ELECTRON BEAM EXPOSURE, AND EXPOSURE SYSTEM
Document Type and Number:
Japanese Patent JP2005093813
Kind Code:
A
Abstract:

To provide a method for matching an exposure pattern which is for exposure in a high-throughput electron beam exposure apparatus using a mask having a large-aperture pattern to other exposure patterns on the specimen, and to provide an exposure system.

The exposure system has an electron beam exposure apparatus for projecting an electron beam to a stencil mask 30 for exposing a specimen 40 to a shaped electron beam 15, a pattern deformation measuring unit 65 for measuring the deformation of the other pattern projected to the specimen, and a stencil mask manufacturing unit 70 for manufacturing an electron beam exposure stencil mask 85 for use in the electron beam exposure apparatus. The stencil mask manufacturing unit 70 manufactures a stencil mask having an aperture pattern deformed in response to the deformation of the other pattern measured by the pattern deformation measuring unit 65.


Inventors:
KAWAMURA YUKISATO
SHIN TAKUJI
Application Number:
JP2003000326545
Publication Date:
April 07, 2005
Filing Date:
September 18, 2003
Export Citation:
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Assignee:
TOKYO SEIMITSU CO LTD
International Classes:
G03F7/20; H01J37/09; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; H01J37/09; H01J37/305
Attorney, Agent or Firm:
青木 篤
鶴田 準一
島田 哲郎
土屋 繁
西山 雅也