To provide a method for manufacturing a substrate for a mask blank having a flatness corresponding to an exposure apparatus equipped with a correcting function of a photomask shape.
A pre-chucking main surface shape on the main surface of a substrate in a measurement region is measured. A post-chucking main surface shape of the substrate is obtained by simulating a state when a photomask prepared from the substrate is set in an exposure apparatus, based on the pre-chucking main surface shape of the substrate and based on a shape of a mask stage. The substrate is subjected to a correction process of calculating a first approximate curve approximating the cross-sectional shape of the post-chucking main surface shape along a first direction in a correction region, calculating an approximate curved face from the first approximate curve, and deducting the curved face from the post-chucking main surface shape, so as to calculate a corrected main surface shape. If the flatness of the corrected main surface shape in the correction region is equal to or lower than a predetermined threshold, the substrate is selected.
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Amada Masayuki
Yoshimasa Okada
Toru Kanno
Tsutomu Mizoguchi
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