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Title:
METHOD OF MANUFACTURING TARGET MATERIAL FOR SPUTTERING TARGET, AND CLAW MEMBER
Document Type and Number:
Japanese Patent JP2016044333
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a target material for a sputtering target, with which occurrence of a crack or deformation can be suppressed even when a total length of a cylindrical ceramic to be processed is 500 mm or more, and a claw member.SOLUTION: A method of manufacturing a target material for a sputtering target according to an embodiment includes steps of; inserting three or more support claws to 10% or more of a total length of a cylindrical ceramic at a hollow part of the cylindrical ceramic having a total length of 500 mm or more; supporting the cylindrical ceramic by bringing the three or more support claws into contact with an inner peripheral surface of the cylindrical ceramic, respectively; and processing an outer peripheral surface of the cylindrical ceramic by rotating the cylindrical ceramic supported by the three or more support claws in a circumferential direction of the cylindrical ceramic.SELECTED DRAWING: Figure 3

Inventors:
SHIBAO MASANORI
TERAMURA KYOSUKE
TAKEUCHI TOMOYA
Application Number:
JP2014169807A
Publication Date:
April 04, 2016
Filing Date:
August 22, 2014
Export Citation:
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Assignee:
MITSUI MINING & SMELTING CO
International Classes:
C23C14/34; B24B5/22; C04B35/00; C04B35/453; H01L21/28; H01L21/285
Domestic Patent References:
JPS6316935A1988-01-23
JP2005281862A2005-10-13
JP2011177889A2011-09-15
Foreign References:
WO2014030362A12014-02-27
Attorney, Agent or Firm:
Hiroaki Sakai