Title:
アモルファス状金属酸化物の薄膜材料の製造方法
Document Type and Number:
Japanese Patent JP4093532
Kind Code:
B2
Abstract:
Amorphous metal oxide thin film is produced by removing through oxygen plasma treatment the organic component from an organics/metal oxide composite thin film having thoroughly dispersed therein such organic component at molecular scale. This ensures production of amorphous metal oxide thin film with low density and excellent thickness precision.
Inventors:
Toyoki Kunitake
Ichinose Izumi
Shigenori Fujikawa
Yellow Country
Ichinose Izumi
Shigenori Fujikawa
Yellow Country
Application Number:
JP2001392088A
Publication Date:
June 04, 2008
Filing Date:
December 25, 2001
Export Citation:
Assignee:
RIKEN
International Classes:
C01B13/14; C01G23/07; C01G25/00; C01G25/02; C23C8/10; C23C8/36; C23C18/12; C23C26/00
Domestic Patent References:
| JP11183711A | ||||
| JP2000007306A | ||||
| JP2000327310A | ||||
| JP1212203A |
Other References:
Jianguo HUANG et al.,Preparation of Nanoporous Titania Films by Syrface Sol-Gel Process Accompanied by Low-Temperature Oxygen Plasma Treatment,Langmuir,米国,2002年11月12日,vol. 18,pp. 9048-9053
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes