To provide a translucent electromagnetic wave shielding film that forms a thin line pattern of an electromagnetic wave shielding material exhibiting high EMI shieldability and high transparency simultaneously, and can be employed in inexpensive mass production of translucent electromagnetic wave shielding film.
In a translucent electromagnetic wave shielding film having a conductive metal portion and a light transmissive portion, a silver halide containing layer containing a silver halide and a binder is exposed as a photosensor provided on a plastic film, a metal silver portion and a light transmissive portion (the light transmissive portion has substantially no nucleus of physical development) are formed by carrying out development and fixing, a conductive metal portion carrying conductive metal particles at the metal silver portion is also formed by carrying out physical development and/or plating of the metal silver portion, wherein the silver halide is doped with rhodium ions or iridium ions, its an average grain size is 0.1-1,000 nm, its development is carried out using developer containing an image quality improvement agent, a gradation after development exceeds 4.0, a surface resistance of a light transmissive electromagnetic wave shield shielding film is 2.5 /sq or less after physical development and/or plating, and the line width of the conductive metal portion is 20 m or less.
SASAKI HIROTOMO
NISHIZAKURA RYO
TAKADA SHUNJI
| JP2000149773A | 2000-05-30 | |||
| JPH11170421A | 1999-06-29 | |||
| JP2001281822A | 2001-10-10 | |||
| JPH06194762A | 1994-07-15 | |||
| JPH0743868A | 1995-02-14 |